HFE-7200 Mixture – Special solvent

High-performance fluid for precision cleaning and heat transfer (replacement for 3M™ Novec™ 7200)

HFE-7200 Mixture is a high-performance fluid specifically developed for the semiconductor industry for precision cleaning, residue-free drying, and reliable cooling in sensitive manufacturing processes. The combination of two hydrofluoroether components (CAS 163702-06-5 and 163702-05-4) enables exceptionally stable and reproducible process performance.

Especially in critical applications such as CVD systems, ion implantation, or chiller systems, HFE-7200 excels in its ability to effectively remove even the finest contaminants—without leaving residues or attacking sensitive materials.

Its very low surface tension ensures optimal wetting even of complex geometries, while its low viscosity guarantees rapid and uniform distribution. This allows components to be efficiently cleaned and reliably dried—even in hard-to-reach areas.

Thanks to its high chemical purity and tightly controlled physical properties (e.g., boiling point, vapor pressure, and viscosity), the fluid offers maximum process reliability and consistent cleaning results while simultaneously protecting against contamination and corrosion.

HFE-7200 maintains excellent flowability even at low temperatures. Its extremely low pour point, combined with its low viscosity, enables reliable cleaning and cooling in the low-temperature range.

The fluid is non-flammable, electrically insulating, and meets the highest environmental and occupational safety standards. With an ODP of 0 and a low GWP, it represents a modern alternative to traditional fluorochemicals.

HFE-7200 Mixture is qualified as a direct replacement for 3M™ Novec™ 7200 and meets the stringent purity requirements of modern semiconductor manufacturing.